• Button
    • captcha
      Reload
You are eager to develop and study a complex multilayer structure but being obstructed by limited time or resources on growing every single material on your own? Let us move the rock away from you!

With our well-established PVD/CVD process and solid experience in thin film growth Alineason can add value to your research activity, in the field of epitaxy, by offering you a wide range of common and special epitaxial films with the best quality. You will be relieved from insignificant task and able to focus on the most important topic.






Category Specifications

  • Layer sequence and layer thickness can be defined by customer
  • Composition of solid solutions can be varied continuously
  • Deposition on coducting bottom layer possible
  • Materials or specifications beyond the standard offers on request

Group

Material

Method

Substrate 

Dimension

Compound Semiconductors

Arsenide: GaAs, AlGaAs, GaInAs
Phosphide: InP, GaInP
Nitride: GaN, AlN

MBE / MOVPE

GaAs
AlN
Sapphire

Ø 2 - 4" Wafer

Lanthanum-containing Oxides

LaxCa1-xMnO3
LaxSr1-xMnO3
LaxSr1-xCoO3
LaxSr1-xSnO3

PLD

SrTiO3
LSAT
NdGaO3

5 × 5 mm2
5 × 10 mm2
10 × 10 mm2

Dielectrics / Ferroelectrics

BaTiO3, SrTiO3, BaxSr1-xTiO3
PbTiO3, PbZrO3, PbZrxTi1-xO3
BiFeO3

PLD

SrTiO3
LSAT
MgO
NdGaO3

5 × 5 mm2
5 × 10 mm2
10 × 10 mm2